NSF ECCS-0821606 MRI: Acquisition of an Inductively Coupled Plasma (ICP) Etcher for Nano/Micro Device Fabrication
Prof. Yong Shi and co-PIs Chang-Hwan Choi, Frank Fisher, and EH Yang (Mechanical Engineering) and Stefan Strauf (Physics and Engineering Physics) were awarded an MRI grant to enable the purchase of an Inductively Coupled Plasma (ICP) Etcher for nano/micro device fabrication. The requested ICP etching system will greatly augment existing micro/nano fabrication capabilities within the MicroDevices Laboratory (MDL) at Stevens. Research projects directly benefiting from the requested system include: 1). Nano and micro devices for sensing, communications and medicine; 2) Single-electron carbon nanotube memory devices; 3) Nanoengineered surfaces for microfluidic and nanobioscience applications; and 4) Bottom-up prototyping of microchemical systems.