| Description: Discussions of aspects of the technology of processing procedures involved in the fabrication of microelectronic devices and microelectromechanical systems (MEMS). Topics with respect to IC fabrication include crystal growth, epitaxy, silicon oxide growth, impurity doping, ion implantation, photo and electron beam lithography, etching, sputtering, thin film metallization, passivation and packaging. Students will also learn that MEMS are sensors and actuators that are designed using different areas of engineering disciplines and they are constructed using a microlithographically-based manufacturing process in conjunction with both semiconductor and micromachining microfabrication technologies. |